Tech Next Lab (TNL) provides specific deposition reactor based epitaxial growth modeling services as listed below;

CVD Reactor

Si, SiGe, SiC, Diamond etc epitaxial growth modeling at atomistic scale

MOCVD Reactor (Showerhead)

Vertical precursors flow reactor architecture based group III-V nitride, arsenide and antimonide materials epitaxial growth.

MOCVD Reactor (Injector)

Horizontal precursors flow reactor architecture based group III-V nitride, arsenide and antimonide materials epitaxial growth.

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MBE Reactor

Defect modeling with optimization of input parameters

Defect modeling

Dinstinction between types of defects and their densities with exact location in the lattice

LASER

Regrowth over patterned substrate with void dimensions modeling, calibration of emitting wavelengths

Surface emitting LASER epitaxial growth etc.